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_a051101273X _q(electronic bk.) |
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082 | 0 | 4 |
_a530.4/275 _221 |
100 | 1 |
_aVenables, John, _d1936- _9184892 _eσυγγραφέας. |
|
245 | 1 | 0 |
_aIntroduction to surface and thin film processes / _cJohn A. Venables. |
260 |
_aCambridge, UK ; _aNew York : _bCambridge University Press, _c2000. |
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300 |
_a1 ηλεκτρονική πηγή (xvi, 372 σ.) : _bεικ. |
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504 | _aΠεριλαμβάνει βιβλιογραφικές παραπομπές (σ. 331-361) και ευρετήριο. | ||
505 | 0 | 0 |
_tIntroduction to surface processes -- _tSurfaces in a vacuum : ultra-high vacuum techniques and processes -- _tElectron-based techniques for examining surface and thin film processes -- _tSurface processes in adsorption -- _tSurface processes in epitaxial growth -- _tElectronic structure and emission processes at metallic surfaces -- _tSemiconductor surfacess and interfaces -- _tSurface processes in thin film devices -- _tPostscript -- where do we go from here? |
520 | _aThis book covers the experimental and theoretical background to surface and thin film processes, presenting extensive leads into practical and research literature, as well as to resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains detailed problems. Suitable as a graduate textbook and sourcebook. | ||
650 | 4 | 0 |
_aΛεπτά υμένια _9143507 |
650 | 0 |
_aΧημεία επιφανειών _930112 |
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655 | 0 | _aΗλεκτρονικά βιβλία | |
856 | 4 | 0 | _uhttp://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=73035 |
942 |
_2ddc _cERS |
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998 |
_cΓκόγκου _d12-2020 |